Lead Lanthanum Zirconium Titanate, PLZT, Pb1-xLax(ZryTi1-y)1-0.25xO3 Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density and target geometry. All materials provided by SMC are furnished with a Certificate of Analysis stipulating exact purity and trace elements present in the product.


Purity99.9%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm