Terbium Oxide (Tb4O7) Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. SMC has the capability to manufacture different sputtering target configurations with various production techniques and raw materials to meet sputtering equipment specifications and process requirements. With a large purchasing and production capacity, SMC can supply sputtering targets with high quality at very competitive prices.


Purity99.9%, 99.95%, 99.99%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm