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ST0255 Titanium Fluoride (TiF3) Sputtering Targets
  • Catalog No.ST0255
  • Chemical FormulaTiF3
  • CAS Number13470-08-1
  • Purity99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Titanium fluoride sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high quality TiF3 sputtering targets at the most competitive price.

 

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Titanium Fluoride Sputtering Target Target

Titanium fluoride sputtering target is a type of fluoride ceramic sputtering target composed of titanium and fluorine.

Purity 99.9%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Titanium Fluoride Sputtering Target Application

The titanium fluoride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Titanium Fluoride Sputtering Target Packing

Our titanium fluoride sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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