Tungsten Silicide (WSi2) Sputtering Targets

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Stanford Materials Corporation (SMC) provides a full range of sputtering target materials including: precious metals, pure metals, alloys, ceramics, cermets, borides, oxides, carbides, nitrides, silicides, and fluorides. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devises as well as the latest process equipment. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.


Purity99.5%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm