Zirconium Silicide (ZrSi2) Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We can provide various sputtering targets to fit all commercially available systems or to specific dimensions required for your particular applications. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.


Purity99.9%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm