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ST0208 Aluminum Nitride (AlN) Sputtering Targets
  • Catalog No.ST0208
  • Chemical FormulaAlN
  • CAS Number4304-00-5
  • Purity99.5%, 99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The aluminum nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality aluminum nitride sputter targets at the most competitive prices.

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Aluminum Nitride (AlN) Sputtering Targets Description

Stanford Materials Corporation (SMC) is a leading sputtering target manufacturer in a variety of markets including semiconductors, Wireless, Photonics, Data Storage, Hybrid/Micro electronics, Memory, and Performance Films. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry-leading sputtering targets.?We are able to produce targets of rare or less frequently used compositions as well as a wide array of standard items at competitive prices.

Aluminum Nitride (AlN) Sputtering Targets Specification

Purity 99.5%, 99.9%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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