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ST0212 Iron Nitride (FeN4) Sputtering Targets
  • Catalog No.ST0212
  • Chemical FormulaFeN4
  • CAS Number37245-77-5
  • Purity99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The iron nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality iron nitride sputter targets at the most competitive prices.

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sc/1670481981-normal-iron-nitride-sputter-target.jpg

Iron Nitride (FeN4) Sputtering Targets Description

Stanford Materials Corporation (SMC) is a leading sputtering target manufacturer in a variety of markets including: semiconductors, Wireless, Photonics, Data Storage, Hybrid/Micro electronics, Memory and Performance Films. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density, and target geometry. During the past 17 years, we have provided high-quality products for thousands of customers all over the world.

Iron Nitride (FeN4) Sputtering Targets Specification

Purity 99.9%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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