The hafnium carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality hafnium carbide sputter targets at the most competitive prices.
Hafnium Carbide sputtering target from Stanford Materials Corporation (SMC) is a carbide ceramic sputtering material with the formula HfC.
| Compound Formula | HfC |
| Molecular Weight | 190.5 |
| Appearance | Black |
| Melting Point | 3,900° C |
| Boiling Point | N/A |
| Density | 12.20 g/cm3 |
The hafnium carbide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our hafnium carbide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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