Cobalt Titanium (Co/Ti) Sputtering Targets

Home » Sputtering Targets » Cobalt Titanium (Co/Ti) Sputtering Targets


Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. SMC has the capability to manufacture different sputtering target configurations with various production techniques and raw materials to meet sputtering equipment specifications and process requirements. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.


Purity99.9%, 99.95%, 99.99%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm