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ST0203 Zinc Oxide (ZnO) Sputtering Targets
  • Catalog No.ST0203
  • Chemical FormulaZnO
  • CAS Number1314-13-2
  • Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The zinc oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality zinc oxide sputter targets at the most competitive prices.

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Zinc Oxide (ZnO) Sputtering Targets Description

As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devices as well as the latest process equipment. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding, and full characterization.

Zinc Oxide (ZnO) Sputtering Targets Specification

Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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