Chromium Nickel (Cr/Ni) Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Because of our unique technology and development, SMC can assure consistent and high availability of sputtering targets that meet our customers requirements. We are always looking for ways to improve our fabrication techniques in order to supply more value and better products.


Purity99.9%, 99.95%
Composition Custom
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm