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ST0013 Erbium Sputtering Target
  • Catalog No.ST0013
  • Chemical FormulaEr
  • CAS Number7440-52-0
  • Purity99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The erbium sputtering target is available in various forms, purities, sizes, and prices. Stanford  Materials (SMC) is a trusted sputtering target supplier working with international partners to bring you the highest quality products.

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Erbium (Er) Sputtering Targets Description

 Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We provide high purity metal, metal alloy and ceramic sputtering targets in more than 500 compositions. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.

Erbium (Er) Sputtering Targets Specification

Purity 99.9%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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