Tantalum Oxide (Ta2O5) Sputtering Targets

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As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density and target geometry. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.


Purity99.9%, 99.95%, 99.99%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm