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ST0299 Tantalum Boride (TaB2) Sputtering Targets - Sputtering Targets
  • Catalog No.ST0299
  • Chemical FormulaTaB2
  • CAS Number12007-35-1
  • Purity99.5%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The tantalum boride sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality tantalum boride sputter targets at the most competitive prices.

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Tantalum Boride Sputtering Target Description

Tantalum boride sputtering target is a type of boride ceramic sputtering target composed of tantalum and boron.

Tantalum Boride Sputtering Target Application

The tantalum boride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Tantalum Boride Sputtering Target Packing

Our tantalum boride TaB2 sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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