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ST0216 Tantalum Nitride (TaN) Sputtering Targets
  • Catalog No.ST0216
  • Chemical FormulaTaN
  • CAS Number12033-62-4
  • Purity>99.5%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The tantalum nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford  Materials (SMC) offers high-quality tantalum nitride sputter targets at the most competitive prices.

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sc/1670922174-normal-tantalum-nitride-sputter-target.jpg

Tantalum Nitride (TaN) Sputtering Targets Description

Stanford Materials Corporation (SMC) provides a full range of sputtering target materials including precious metals, pure metals, alloys, ceramics, cermets, borides, oxides, carbides, nitrides, silicides, and fluorides. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density, and target geometry. We are able to produce targets of rare or less frequently used compositions as well as a wide array of standard items at competitive prices.

Tantalum Nitride (TaN) Sputtering Targets Specification

Purity >99.5%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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