Tantalum Silicide (TaSi2) Sputtering Targets

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As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry leading sputtering targets. We are able to produce targets of rare or less frequently used compositions as well as a wide array of standard items at competitive prices.


Purity99.5%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm