As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. SMC has the capability to manufacture different sputtering target configurations with various production techniques and raw materials to meet sputtering equipment specifications and process requirements. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.
|Shape||Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made|
|Size||Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm|