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ST0149 Hafnium Oxide (HfO2) Sputtering Target
  • Catalog No.ST0149
  • Chemical FormulaHfO2
  • CAS Number12055-23-1
  • Purity99.9%, 99.95%, 99.99%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The hafnium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality hafnium oxide sputter targets at the most competitive prices.

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sc/1670576786-normal-hafnium-oxide-sputter-target.jpg

Hafnium Oxide (HfO2) Sputtering Targets Description

Stanford Materials Corporation (SMC) is a market-leading manufacturer and supplier of sputtering targets and thin film coating materials. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devices as well as the latest process equipment. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.

Hafnium Oxide (HfO2) Sputtering Targets Specification

Purity 99.9%, 99.95%, 99.99%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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