Aluminum (Al) Sputtering Targets

Home » Sputtering Targets » Aluminum (Al) Sputtering Targets


Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry leading sputtering targets. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.


Purity99.99%, 99.9995%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm