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ST0087 Copper Germanium (Cu/Ge) Sputtering Targets
  • Catalog No.ST0087
  • Chemical FormulaCu/Ge
  • CAS Number7440-50-8 | 7440
  • Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The copper germanium sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality copper germanium sputter targets at the most competitive prices.

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Copper Germanium (Cu/Ge) Sputtering Targets Description

Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. We can provide various sputtering targets to fit all commercially available systems or to specific dimensions required for your particular applications. We are able to produce targets of rare or less frequently used compositions as well as a wide array of standard items at competitive prices.

Copper Germanium (Cu/Ge) Sputtering Targets Specification

Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Composition Custom
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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