The hafnium nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality hafnium nitride sputter targets at the most competitive prices.
Hafnium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula HfN.
The hafnium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our hafnium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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