Tin Sulfide (SnS2) Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We provide high purity metal, metal alloy and ceramic sputtering targets in more than 500 compositions. With a large purchasing and production capacity, SMC can supply sputtering targets with high quality at very competitive prices.


Purity99.9%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm