Ion implantation is an important process in the manufacture of semiconductors. The most important part of an implanter system is the beam path. Here, the ions are generated, concentrated, accelerated, and targeted towards the wafer.
Our heat-resistant components are made from molybdenum and tungsten due to these materials ideal combination of corrosion resistance, strength, and high thermal conductivity.
Ion Implantation Components Properties:
High Melting point
Outstanding creep resistance
Excellent corrosion resistance
Good electrical and thermal conductivity