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ST0142 Cobalt Oxide Sputtering Target
  • Catalog No.ST0142
  • Chemical FormulaCoO
  • CAS Number1307-96-6
  • Purity99.9%, 99.95%, 99.99%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Stanford Materials (SMC) provides the best cobalt oxide sputtering target on the market with a competitive price and great delivery time. Customized forms are available upon request.

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Cobalt Oxide (CoO) Sputtering Targets Description

Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density, and target geometry. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding, and full characterization.

Cobalt Oxide (CoO) Sputtering Targets Specification

Purity 99.9%, 99.95%, 99.99%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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