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ST0148 Gadolinium Oxide Sputtering Target, Gd2O3
  • Catalog No.ST0148
  • Chemical FormulaGd2O3
  • CAS Number12064-62-9
  • Purity99.9%, 99.95%, 99.99%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The gadolinium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality gadolinium oxide sputter targets at the most competitive prices.

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Gadolinium Oxide Sputtering Target Description

Gadolinium oxide sputtering target from Stanford Materials Corporation (SMC) is an oxide sputtering material containing Gd and O.

Gadolinium Oxide Sputtering Target Specification

Material Type   Gadolinium Oxide
Compound Formula Gd2O3
Molecular Weight 362.5
Appearance White
Melting Point 2,420° C (4,388° F)
Density 7.407 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Gadolinium Oxide Sputtering Target Bonding Service

Indium Bonding and Elastomer Bonding are available for gadolinium oxide sputtering targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. 

Gadolinium Oxide Sputtering Target Application

The gadolinium oxide Gd2O3 sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Gadolinium Oxide Sputtering Target Packaging

Our gadolinium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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