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ST0152 Indium Iron Oxide Sputtering Target
  • Catalog No.ST0152
  • Chemical FormulaInFe2O4
  • CAS Number58942-99-7
  • Purity99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The indium iron oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality indium iron oxide sputter targets at the most competitive prices.

 

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Indium Iron Oxide Sputtering Target Description

Indium iron oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing In, Fe and O.

Purity 99.9%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Indium Iron Oxide Sputtering Target Application

The indium iron oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Indium Iron Oxide Sputtering Target Packing

Our indium iron oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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