Manganese Copper (Mn/Cu) Sputtering Targets

Home » Sputtering Targets » Manganese Copper (Mn/Cu) Sputtering Targets


As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devises as well as the latest process equipment. All materials provided by SMC are furnished with a Certificate of Analysis stipulating exact purity and trace elements present in the product.


Purity99.9%, 99.95%, 99.99%
Composition Custom
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm