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ST0630 Manganese Copper (Mn/Cu) Sputtering Targets
  • Catalog No.ST0630
  • MaterialManganese Copper (Mn/Cu)
  • Purity99.9% ~ 99.99%

Stanford Materials (SMC) specializes in producing high-purity manganese copper Sputtering Targets using quality assurance processes to guarantee product reliability. Various shapes, such as discs are available.

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Manganese Copper (Mn/Cu) Sputtering Targets Description

As the leading supplier of planar and rotary sputtering targets, Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm to work with both older sputtering devices as well as the latest process equipment. All materials provided by SMC are furnished with a Certificate of Analysis stipulating the exact purity and trace elements present in the product.

Manganese Copper (Mn/Cu) Sputtering Targets Specification

Purity 99.9%, 99.95%, 99.99%
Composition Custom
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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