Stanford Materials Corporation (SMC) offers innovative solutions for optimal sputtering results and an efficient coating process.
Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We secure the long-term availability of raw materials, constantly work to develop new product dimensions and geometries and adapt our production capacity to our customer's volume requirements. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding, and full characterization.
| Purity | 99.9%, 99.95% |
|---|---|
| Composition | Custom |
| Shape | Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made |
| Size | Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm |
Our nickel iron sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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