Nickel Iron (Ni/Fe) Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We secure long-term availability of raw materials, constantly work to develop new product dimensions and geometries, and adapt our production capacity to our customers volume requirements. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.

Purity99.9%, 99.95%
Composition Custom
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm