Nickel Silicide (NiSi2) Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. We secure long-term availability of raw materials, constantly work to develop new product dimensions and geometries, and adapt our production capacity to our customers volume requirements. We are always looking for ways to improve our fabrication techniques in order to supply more value and better products.


Purity99.9%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm