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ST0268 Titanium Silicide (TiSi2) Sputtering Targets
  • Catalog No.ST0268
  • Chemical FormulaTiSi2
  • CAS Number12039-83-7
  • Purity>99.5%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Titanium silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality TiSi2 sputtering targets at the most competitive price.

 

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Titanium Silicide Sputtering Target Description

Titanium silicide sputtering target is a type of silicide ceramic sputtering target composed of titanium and silicon.

Purity >99.5%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Titanium Silicide Sputtering Target Application

The titanium silicide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Titanium Silicide Sputtering Target Packing

Our titanium silicide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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