Titanium silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality TiSi2 sputtering targets at the most competitive price.
Titanium silicide sputtering target is a type of silicide ceramic sputtering target composed of titanium and silicon.
| Purity | >99.5% |
|---|---|
| Shape | Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made |
| Size | Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm |
The titanium silicide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our titanium silicide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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