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ST0114 Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Targets
  • Catalog No.ST0114
  • Chemical FormulaTi/Al/V
  • CAS Number7440-32-6 | 7429
  • Purity99.9%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The titanium aluminum vanadium sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality titanium aluminum vanadium sputter targets at the most competitive prices.

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Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Targets Description

Stanford Materials Corporation (SMC) specializes in the manufacture of multi-component sputtering targets of optical, electronic, piezo and ferroelectric, superconductor and fuel cell materials for researchers everywhere. We can provide various sputtering targets to fit all commercially available systems or to specific dimensions required for your particular applications. All materials provided by SMC are furnished with a Certificate of Analysis stipulating the exact purity and trace elements present in the product.

Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Targets Specification

Purity 99.9%
Composition Custom
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm

 

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