Titanium Aluminum (Ti/Al) Sputtering Targets

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Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry leading sputtering targets. All materials provided by SMC are furnished with a Certificate of Analysis stipulating exact purity and trace elements present in the product.


Purity99.9%, 99.95%, 99.99%
Composition Custom
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm