The titanium aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials (SMC) offers high-quality titanium aluminum sputter targets at the most competitive prices.
Stanford Materials Corporation (SMC) specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. The unique synergy between our engineering, manufacturing, and analytical teams has allowed us to produce industry-leading sputtering targets.?All materials provided by SMC are furnished with a Certificate of Analysis stipulating the exact purity and trace elements present in the product.
| Purity | 99.9%, 99.95%, 99.99% |
|---|---|
| Composition | Custom |
| Shape | Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made |
| Size | Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm |
Inquiry List
