Gallium Telluride (Ga2Te3) Sputtering Targets

Home » Sputtering Targets » Gallium Telluride (Ga2Te3) Sputtering Targets


Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Many years of experience in manufacturing metal and alloy products allow SMC to meet our customers increasing requirements with respect to purity, grain structure, density and target geometry. SMC pride ourselves on our excellent service and competitive prices.


Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDisc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
SizeCircular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm