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ST0186 Silicon Monoxide (SiO) Sputtering Targets
  • Catalog No.ST0186
  • Chemical FormulaSiO
  • CAS Number10097-28-6
  • Purity99.9%, 99.95%, 99.99%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The silicon monoxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) offers high-quality silicon monoxide sputter targets at the most competitive prices.

 

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Silicon Monoxide Sputtering Target Description

Silicon monoxide sputtering target from Stanford Materials Corporation (SMC) is an oxide sputtering material containing Si and O.

Silicon Monoxide Sputtering Target Specification

Compound Formula SiO
Molecular Weight 44.085
Appearance black-brown glassy solid
Melting Point 1702 °C
Boiling Point 1880 °C
Density 2.13 g/cm
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Silicon Monoxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for SiO sputtering material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Silicon Monoxide Sputtering Target Packaging

Our silicon monoxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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