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ST0023 Iron Sputtering Target
  • Catalog No.ST0023
  • Chemical FormulaFe
  • CAS Number7439-89-6
  • Purity99.9%, 99.95%
  • ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

The iron sputtering target is available in various forms, purities, sizes, and prices. Stanford Materials Corporation (SMC) is a trusted sputtering target supplier working with international partners to bring you the highest quality products.

sc/1671005854-normal-Fe_ST.jpg
sc/1671005854-normal-Fe_ST.jpg

Iron Sputtering Target Specification

Material Type Iron
Symbol Fe
Color/Appearance Solid
Melting Point 1,535 °C
Sputter DC
Density 7.86 g/cc
Thermal Conductivity 80 W/m.K
Coefficient of Thermal Expansion 11.8 x 10-6/K
Comments Attacks W. Films hard, smooth. Preheat gently to outgas.
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Iron Sputtering Target Application

The iron sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packaging

Our iron sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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